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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9293382 B1

PDFFull Text
Date of Patent:
Mar. 22, 2016

Filed:

Oct. 24, 2014

Voltage contrast inspection of deep trench isolation

Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Norbert Arnold, Hopewell Junction, NY (US);

Jin Liu, Chappaqua, NY (US);

Brian W. Messenger, Newburgh, NY (US);

Oliver D. Patterson, Poughkeepsie, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorney:

Scully, Scott, Murphy & Presser, P.C.

Primary Examiner:

Long K Tran

Assistant Examiner:

Dzung Tran

Int. Cl.
CPC ...
H01L 23/58 (2006.01); H01L 27/12 (2006.01); G01R 31/26 (2014.01); H01L 21/20 (2006.01); H01L 21/66 (2006.01); H01L 49/02 (2006.01); H01L 21/84 (2006.01); H01L 29/66 (2006.01); H01L 27/108 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 22/14 (2013.01); H01L 21/762 (2013.01); H01L 21/84 (2013.01); H01L 22/32 (2013.01); H01L 22/34 (2013.01); H01L 27/10861 (2013.01); H01L 27/10894 (2013.01); H01L 27/1203 (2013.01); H01L 28/40 (2013.01); H01L 28/60 (2013.01); H01L 29/66181 (2013.01);
Abstract

A method including forming a first test structure and a second test structure in electrical contact with an inner buried plate and an outer buried plate, respectively, where the first and second test structures each comprise a deep trench filled with a conductive material, and measuring the voltage of the inner buried plate and the outer buried plate immediately after the formation of a deep trench isolation structure, where the inner buried plate and the outer buried plate are positioned on opposite sides of the deep trench isolation structure.

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