The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Sep. 28, 2014
Carl Zeiss Microscopy Gmbh, Jena, DE;
Applied Materials Israel, Ltd., Rehovot, IL;
Dirk Zeidler, Oberkochen, DE;
Rainer Knippelmeyer, Utting am Ammersee, DE;
Thomas Kemen, Aalen, DE;
Mario Muetzel, Oberkochen, DE;
Stefan Schubert, Oberkochen, DE;
Nissim Elmaliah, Raanana, IL;
Steven Rogers, D.N. Emek Sorek, IL;
CARL ZEISS MICROSCOPY GMBH, Jena, DE;
APPLIED MATERIALS ISRAEL, LTD., Rehvot, IL;
Abstract
A charged particle multi-beam inspection system comprises a beam generator directing a plurality of primary charged particle beams onto an object to produce an array of beam spots; an array of a first number of detection elements generating detection signals upon incidence of electrons; imaging optics imaging the array of beam spots onto the array of detection elements; wherein the beam generator includes a multi-aperture plate having an array of a second number of apertures greater than the first number; wherein the beam generator includes a selector having plural different states, wherein, in each of the plural different states, the apertures of a different group of apertures are each traversed by one primary charged particle beam, wherein a number of the apertures of the different group of apertures is equal to the first number.