The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Feb. 21, 2014
Peter C. Hill, Washington, DC (US);
Patrick L. Thompson, Laurel, MD (US);
David L. Aronstein, Silver Spring, MD (US);
Matthew R. Bolcar, Laurel, MD (US);
Jeffrey S. Smith, Baltimore, MD (US);
Peter C. Hill, Washington, DC (US);
Patrick L. Thompson, Laurel, MD (US);
David L. Aronstein, Silver Spring, MD (US);
Matthew R. Bolcar, Laurel, MD (US);
Jeffrey S. Smith, Baltimore, MD (US);
Abstract
A method of measuring aberrations in a null-lens including assembly and alignment aberrations. The null-lens may be used for measuring aberrations in an aspheric optic with the null-lens. Light propagates from the aspheric optic location through the null-lens, while sweeping a detector through the null-lens focal plane. Image data being is collected at locations about said focal plane. Light is simulated propagating to the collection locations for each collected image. Null-lens aberrations may extracted, e.g., applying image-based wavefront-sensing to collected images and simulation results. The null-lens aberrations improve accuracy in measuring aspheric optic aberrations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile