The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2015

Filed:

Apr. 15, 2008
Applicants:

Toru Kaga, Tokyo, JP;

Kenji Terao, Tokyo, JP;

Masahiro Hatakeyama, Tokyo, JP;

Kenji Watanabe, Tokyo, JP;

Yoshihiko Naito, Tokyo, JP;

Takeshi Murakami, Tokyo, JP;

Norio Kimura, Tokyo, JP;

Inventors:

Toru Kaga, Tokyo, JP;

Kenji Terao, Tokyo, JP;

Masahiro Hatakeyama, Tokyo, JP;

Kenji Watanabe, Tokyo, JP;

Yoshihiko Naito, Tokyo, JP;

Takeshi Murakami, Tokyo, JP;

Norio Kimura, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); G01N 23/203 (2006.01); G01N 23/225 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G01N 23/203 (2013.01); G01N 23/2251 (2013.01); H01J 37/28 (2013.01); G01N 2223/6116 (2013.01); H01J 2237/004 (2013.01); H01J 2237/022 (2013.01); H01J 2237/2446 (2013.01); H01J 2237/2817 (2013.01);
Abstract

The electron beam apparatus is provided with a stage for mounting a sample thereon, a primary optical system for generating an electron beam having an irradiation area and irradiating the electron beam onto the sample, a secondary optical system for detecting electrons which have been generated through the irradiation of the electron beam onto the sample and have acquired structural information of the sample and acquiring an image of the sample about a viewing area and an irradiation area changing section for changing the position of the irradiation area with respect to the viewing area.


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