The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Feb. 17, 2011
Kunihiko Suzuki, Shizuoka, JP;
Shinichi Mitani, Shizuoka, JP;
Kunihiko Suzuki, Shizuoka, JP;
Shinichi Mitani, Shizuoka, JP;
NuFlare Technology, Inc., Shizuoka, JP;
Central Research Institute of Electric Power Industry, Tokyo, JP;
Denso Corporation, Aichi, JP;
Toyota Jidosha Kabushiki Kaisha, Aichi-ken, JP;
Abstract
A deposition apparatusincludes a chamberhaving at its top section a gas inletfor supplying deposition gas. Inside chamberis a susceptoron which to place a substrate; a heaterlocated below the substrate; and a linerfor covering the inner walls of the chamber. Apparatusdeposits a film on the substrateby supplying deposition gasfrom gas inletinto chamberwhile heating substrate. An upper electric resistance heater clusteris located between the inner walls of the chamberand linersuch that the upper heatersurrounds the liner. The upper heateris divided vertically into electric resistance heaters, andwhich are independently temperature-controlled. The substrateis heated with the use of both heaterand the upper heater cluster