The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
Feb. 07, 2012
Yung-yao Lee, Zhubei, TW;
Sophia Wang, Xin-Zhu, TW;
Fei-gwo Tsai, Taipei, TW;
Heng-hsin Liu, New Taipei, TW;
Yung-Yao Lee, Zhubei, TW;
Sophia Wang, Xin-Zhu, TW;
Fei-Gwo Tsai, Taipei, TW;
Heng-Hsin Liu, New Taipei, TW;
Abstract
A method of determining overlay error. The method includes transferring a pattern from a reticle to a wafer and selecting a first set of data points to measure the positional difference between features on the reticle and features on the wafer. The method also includes determining a second set of data points characteristic of the first set of data points but containing fewer data points. A control system for using the second set of data points to dynamically adjust the position of the reticle.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile