The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2015

Filed:

Jun. 21, 2010
Applicants:

Hisashi Hatano, Hitachinaka, JP;

Hiroyuki Yamashita, Hitachinaka, JP;

Hidetoshi Nishiyama, Hitachinaka, JP;

Inventors:

Hisashi Hatano, Hitachinaka, JP;

Hiroyuki Yamashita, Hitachinaka, JP;

Hidetoshi Nishiyama, Hitachinaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/95 (2006.01); G01N 21/956 (2006.01); G01R 31/265 (2006.01); H01L 21/68 (2006.01);
U.S. Cl.
CPC ...
G01N 21/956 (2013.01); G01N 21/9501 (2013.01); G01R 31/2656 (2013.01); H01L 21/681 (2013.01);
Abstract

Provided is a pattern defect inspecting apparatus wherein inspection performance is stabilized. The defect inspecting apparatus, which has a plurality of configuration units and inspects defects on the surface of a sample, is provided with a means for monitoring time-dependent changes and failures of some of or all of the configuration units, and a means for notifying the user of the results of the monitoring. Furthermore, a unit which can perform correction is provided with a correcting means, and also a means for replacing a failure component with a spare component which has been prepared in the device.


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