The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Apr. 10, 2014
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Masaki Ohashi, Joetsu, JP;
Masahiro Fukushima, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Kazuhiro Katayama, Joetsu, JP;
Chuanwen Lin, Joetsu, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units of formulae (1) and (2) and a photoacid generator of formula (3) onto a substrate, baking, exposure, PEB and developing in an organic solvent. In formulae (1) and (2), Ris H, F, CHor CF, Z is a single bond, phenylene, naphthylene, or (backbone)-C(═O)—O—Z'—, Z′ is alkylene, phenylene or naphthylene, XA is an acid labile group, YL is H or a polar group. In formula (3), Rand Rare a monovalent hydrocarbon group, Ris a divalent hydrocarbon group, or Rand R, or Rand Rmay form a ring with the sulfur, L is a single bond or a divalent hydrocarbon group, Xa and Xb are H, F or CF, and k is an integer of 1 to 4.