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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9158194 B1

PDFFull Text
Date of Patent:
Oct. 13, 2015

Filed:

Sep. 27, 2012

Metrology method and apparatus, and device manufacturing method

Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Armand Eugene Albert Koolen, Nuth, NL;

Henricus Petrus Maria Pellemans, Veldhoven, NL;

Maurits Van Der Schaar, Eindhoven, NL;

Peter Clement Paul Vanoppen, Hechtel-Eksel, BE;

Michael Kubis, Düsseldorf, DE;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:

Sterne, Kessler, Goldstein & Fox P.L.L.C.

Primary Examiner:

Colin Kreutzer

Int. Cl.
CPC ...
G01B 11/00 (2006.01); G01B 11/14 (2006.01); G03B 27/32 (2006.01); G03B 27/54 (2006.01); G03B 27/72 (2006.01); G03B 27/74 (2006.01); G03C 5/00 (2006.01); G03F 1/42 (2012.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01); G01N 21/47 (2006.01); G01B 9/04 (2006.01);
U.S. Cl.
CPC ...
G03F 1/42 (2013.01); G01B 9/04 (2013.01); G01N 21/47 (2013.01); G03F 7/70616 (2013.01); G03F 7/70633 (2013.01); G03F 9/70 (2013.01); G03F 9/7069 (2013.01); G03F 9/7088 (2013.01);
Abstract

An approach is used to estimate and correct the overlay variation as function of offset for each measurement. A target formed on a substrate includes periodic gratings. The substrate is illuminated with a circular spot on the substrate with a size larger than each grating. Radiation scattered by each grating is detected in a dark-field scatterometer to obtain measurement signals. The measurement signals are used to calculate overlay. The dependence (slope) of the overlay as a function of position in the illumination spot is determined. An estimated value of the overlay at a nominal position such as the illumination spot's center can be calculated, correcting for variation in the overlay as a function of the target's position in the illumination spot. This compensates for the effect of the position error in the wafer stage movement, and the resulting non-centered position of the target in the illumination spot.

Find Patent Forward Citations

Koolen, Armand Eugene Albert. (2015). Metrology method and apparatus, and device manufacturing method (U.S. Patent No. 9158194). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9158194

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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