The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
May. 31, 2007
Annamalai Lakshmanan, Santa Clara, CA (US);
Ganesh Balasubramanian, Sunnyvale, CA (US);
Francimar Schmitt, Santa Clara, CA (US);
Bok Hoen Kim, San Jose, CA (US);
Annamalai Lakshmanan, Santa Clara, CA (US);
Ganesh Balasubramanian, Sunnyvale, CA (US);
Francimar Schmitt, Santa Clara, CA (US);
Bok Hoen Kim, San Jose, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
The present invention generally provides an apparatus and method for eliminating the 'first wafer effect' for plasma enhanced chemical vapor deposition (PECVD). One embodiment of the present invention provides a method for preparing a chamber after the chamber being idle for a period of time. The method comprises a cleaning step followed by a season step and a heating step adapted to the length of the idle time.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile