The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2015

Filed:

Jan. 16, 2013
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Bonnie T. Chia, Sunnyvale, CA (US);

Song-Moon Suh, Sunnyvale, CA (US);

Cheng-Hsiung Matthew Tsai, Cupertino, CA (US);

Robert Dinsmore, Sunnyvale, CA (US);

Glen T. Mori, Gilroy, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); H01J 37/32 (2006.01); C23C 14/56 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32715 (2013.01); C23C 14/564 (2013.01); H01J 37/32477 (2013.01); H01J 37/32853 (2013.01); H01J 37/3405 (2013.01); H01J 37/3417 (2013.01); H01J 37/3423 (2013.01); H01J 37/3447 (2013.01);
Abstract

Shutter disks for use in process chambers are provided herein. In some embodiments, a shutter disk for use in a process chamber may include a body having an outer perimeter, a top surface of the body, wherein the top surface includes a central portion having a substantially horizontal planar surface, and at least one angled structure disposed radially outward of the central portion, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter, and a bottom surface of the body.


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