The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Jul. 31, 2014
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Charles L. Arvin, Poughkeepsie, NY (US);

Minhua Lu, Mohegan Lake, NY (US);

Eric D. Perfecto, Poughkeepsie, NY (US);

David J. Russell, Owego, NY (US);

Wolfgang Sauter, Eagle-Vail, CO (US);

Krystyna Semkow, Poughquag, NY (US);

Thomas A. Wassick, LaGrangeville, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 23/48 (2006.01); H01L 23/52 (2006.01); H01L 23/498 (2006.01); H01L 21/768 (2006.01); H05K 1/09 (2006.01); H05K 3/40 (2006.01); H05K 3/34 (2006.01);
U.S. Cl.
CPC ...
H01L 23/49816 (2013.01); H01L 21/76843 (2013.01); H01L 21/76885 (2013.01); H01L 23/49866 (2013.01); H05K 1/09 (2013.01); H05K 3/4007 (2013.01); H05K 3/3478 (2013.01); H05K 2201/0338 (2013.01); H05K 2201/0341 (2013.01); H05K 2201/0344 (2013.01); H05K 2201/09745 (2013.01); H05K 2203/041 (2013.01);
Abstract

An interconnect structure that includes a substrate having an electrical component present therein, and a under-bump metallurgy (UBM) stack that is present in contact with a contact pad to the electrical component that is present in the substrate. The UBM stack includes a metallic adhesion layer that is direct contact with the contact pad to the electrical component, a copper (Cu) seed layer that is in direct contact with the metallic adhesion layer layer, a first nickel (Ni) barrier layer that is present in direct contact with copper (Cu) seed layer, and a layered structure of at least one copper (Cu) conductor layer and at least one second nickel (Ni) barrier layer present on the first nickel (Ni) barrier layer. A solder ball may be present on second nickel (Ni) barrier layer.


Find Patent Forward Citations

Loading…