The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Sep. 03, 2013
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Assignee:
FEI COMPANY, Hillsboro, OR (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 2237/1534 (2013.01);
Abstract
A system of investigating aberrations in a charged particle lens system, wherein a charged particle beam is directed from a multitude of directions through a pivot point on a sample stage. An image figure is recorded for each of multiple focus settings at each beam direction setting, creating a set of registered images. This set of images is compared to reference images to derive aberrations present in the lens system without the use of an amorphous sample present.