The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Nov. 21, 2011
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Hans Butler, Best, NL;
Yim Bun Patrick Kwan, Aalen, DE;
Erik Roelof Loopstra, Eindhoven, NL;
Bernhard Geuppert, Aalen, DE;
Marco Hendrikus Hermanus Oude Nijhuis, Eindhoven, NL;
Rodolfo Guglielmi Rabe, Aalen, DE;
Dick Antonius Hendrikus Laro, Breda, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Hans Butler, Best, NL;
Yim Bun Patrick Kwan, Aalen, DE;
Erik Roelof Loopstra, Eindhoven, NL;
Bernhard Geuppert, Aalen, DE;
Marco Hendrikus Hermanus Oude Nijhuis, Eindhoven, NL;
Rodolfo Guglielmi Rabe, Aalen, DE;
Dick Antonius Hendrikus Laro, Breda, NL;
ASML Netherlands B.V., Veldhoven, NL;
Carl Zeiss SMT GMBH, Oberkochen, DE;
Abstract
Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).