The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2015
Filed:
Sep. 26, 2011
Applicants:
Naoyuki Satoh, Nirasaki, JP;
Nobuyuki Nagayama, Nirasaki, JP;
Keiichi Nagakubo, Nirasaki, JP;
Inventors:
Assignee:
TOKYO ELECTRON LIMITED, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); C23C 16/503 (2006.01); C23C 16/505 (2006.01); C23C 16/509 (2006.01); C23C 16/455 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); H01J 37/32 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); C23C 16/455 (2013.01); C23C 16/45561 (2013.01); C23C 16/45563 (2013.01); C23C 16/45565 (2013.01); C23C 16/505 (2013.01); C23C 16/509 (2013.01); H01J 37/3244 (2013.01); H01J 37/32541 (2013.01);
Abstract
An electrode plate for a plasma etching is formed as a disc shape having a predetermined thickness, a plurality of gas holes penetrating a surface of the electrode plate perpendicularly to the surface are provided on different circumferences of a plurality of concentric circles, the electrode plate is divided in a radial direction of the electrode plate into two or more regions, types of gas holes provided in the two or more regions are different from each other by region.