The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Jul. 30, 2013
Globalfoundries, Inc., Grand Cayman, KY;
Jinping Liu, Ballston Lake, NY (US);
Bharat Krishnan, Clifton Park, NY (US);
Bongki Lee, Malta, NY (US);
Vidmantas Sargunas, Clifton Park, NY (US);
Weihua Tong, Mechanicville, NY (US);
Seung Kim, Mechanicville, NY (US);
GLOBALFOUNDRIES, INC., Grand Cayman, KY;
Abstract
Integrated circuits and methods for fabricating integrated circuits are provided. In an embodiment, a method for fabricating an integrated circuit includes forming a channel region of a fin structure with a first side, a second side, an exposed first end surface and an exposed second end surface. A gate is formed overlying the first side and second side of the channel region. The method includes implanting ions into the channel region through the exposed first end surface and the exposed second end surface. Further, the method includes forming source/drain regions of the fin structure adjacent the exposed first end surface and the exposed second end surface of the channel region.