The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Sep. 24, 2010
Erik Roelof Loopstra, Eindhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Sven Pekelder, Breugel, NL;
Dzmitry Labetski, Utrecht, NL;
Uwe Bruno Heini Stamm, Goettingen, DE;
William N. Partlo, Poway, CA (US);
Erik Roelof Loopstra, Eindhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Sven Pekelder, Breugel, NL;
Dzmitry Labetski, Utrecht, NL;
Uwe Bruno Heini Stamm, Goettingen, DE;
William N. Partlo, Poway, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.