The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
Sep. 06, 2012
Matthias Exler, Aalen, DE;
Ulrich Loering, Schwaebisch Gmuend, DE;
Toralf Gruner, Aalen-Hofen, DE;
Holger Walter, Abtsgmuend, DE;
Matthias Exler, Aalen, DE;
Ulrich Loering, Schwaebisch Gmuend, DE;
Toralf Gruner, Aalen-Hofen, DE;
Holger Walter, Abtsgmuend, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.