The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2015
Filed:
Apr. 28, 2012
Shou-sung Chang, Redwood City, CA (US);
Hung Chih Chen, Sunnyvale, CA (US);
Lakshmanan Karuppiah, San Jose, CA (US);
Paul D. Butterfield, San Jose, CA (US);
Erik S. Rondum, San Ramon, CA (US);
Shou-Sung Chang, Redwood City, CA (US);
Hung Chih Chen, Sunnyvale, CA (US);
Lakshmanan Karuppiah, San Jose, CA (US);
Paul D. Butterfield, San Jose, CA (US);
Erik S. Rondum, San Ramon, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods, apparatus, and systems for polishing a substrate are provided. The invention includes an upper platen; a torque/strain measurement instrument coupled to the upper platen; and a lower platen coupled to the torque/strain measurement instrument and adapted to drive the upper platen to rotate through the torque/strain measurement instrument. In other embodiments, the invention includes an upper carriage; a side force measurement instrument coupled to the upper carriage; and a lower carriage coupled to the side force measurement instrument and adapted to support a polishing head. Numerous additional aspects are disclosed.