The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2015
Filed:
Nov. 19, 2012
Applicant:
Intermolecular Inc., San Jose, CA (US);
Inventors:
Prashant B Phatak, San Jose, CA (US);
Venkat Ananthan, Cupertino, CA (US);
Wayne R French, San Jose, CA (US);
Assignee:
Intermolecular, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C40B 50/00 (2006.01); H01L 21/66 (2006.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); C23C 14/042 (2013.01); B01J 2219/00274 (2013.01);
Abstract
A combination of deposition processes can be used to evaluate layer properties using a combinatorial workflow. The processes can include a base ALD process and another process, such as a PVD process. The high productivity combinatorial technique can provide an evaluation of the material properties for given ALD base layer and PVD additional elements. An ALD process can then be developed to provide the desired layers, replacing the ALD and PVD combination.