The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Sep. 23, 2011
Marcel Beckers, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Ferdy Migchelbrink, Amersfoort, NL;
Elmar Evers, Almelo, NL;
Marcel Beckers, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Ferdy Migchelbrink, Amersfoort, NL;
Elmar Evers, Almelo, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile