The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Mar. 24, 2011
Wataru Yoshikawa, Miyagi, JP;
Naoki Matsumoto, Miyagi, JP;
Jun Yoshikawa, Hyogo, JP;
Tokyo Electron Limited, Minato-Ku, Tokyo, unknown;
Abstract
In a dielectric windowfor a plasma processing apparatus, a first dielectric window recessis formed on an outer region of a surface of the dielectric windowin a diametrical direction of the dielectric windowat a side where plasma is generated, and the first dielectric window recessis extended in a ring shape and has a tapered shape inwardly in a thickness direction of the dielectric window. A multiple number of second dielectric window recessestoare formed between the center of the dielectric windowand the first dielectric window recess, and each of the second dielectric window recessestois recessed inwardly in the thickness direction of the dielectric windowfrom the surface of the dielectric window