The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Jul. 30, 2012
Mahbub Rashed, Santa Clara, CA (US);
Marc Tarabbia, Pleasant Valley, NY (US);
Chinh Nguyen, Austin, TX (US);
David Doman, Austin, TX (US);
Juhan Kim, Santa Clara, CA (US);
Xiang Qi, San Jose, CA (US);
Suresh Venkatesan, Danbury, CT (US);
Mahbub Rashed, Santa Clara, CA (US);
Marc Tarabbia, Pleasant Valley, NY (US);
Chinh Nguyen, Austin, TX (US);
David Doman, Austin, TX (US);
Juhan Kim, Santa Clara, CA (US);
Xiang Qi, San Jose, CA (US);
Suresh Venkatesan, Danbury, CT (US);
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
An approach for providing cross-coupling-based designs using diffusion contact structures is disclosed. Embodiments include providing first and second gate structures over a substrate; providing a first gate cut region across the first gate structure, and a second gate cut region across the second gate structure; providing a first gate contact over the first gate structure, and a second gate contact over the second gate structure; and providing a diffusion contact structure between the first and second gate cut regions to couple the first gate contact to the second gate contact.