The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Apr. 23, 2009
Martin D. Tabat, Nashua, NH (US);
Matthew C. Gwinn, Winchendon, MA (US);
Robert K. Becker, Danvers, MA (US);
Avrum Freytsis, Salem, MA (US);
Michael Graf, Belmont, MA (US);
Martin D. Tabat, Nashua, NH (US);
Matthew C. Gwinn, Winchendon, MA (US);
Robert K. Becker, Danvers, MA (US);
Avrum Freytsis, Salem, MA (US);
Michael Graf, Belmont, MA (US);
TEL Epion Inc., Billerica, MA (US);
Abstract
Disclosed is a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system, and associated methods of operation to grow, modify, deposit, or dope a layer upon a substrate. The multiple nozzle and skimmer assembly includes at least two nozzles arranged in mutual close proximity to at least partially coalesce the gas cluster beams emitted therefrom into a single gas cluster beam and/or angled to converge each beam toward a single intersecting point to form a set of intersecting gas cluster beams, and to direct the single and/or intersecting gas cluster beam into a gas skimmer.