The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2015
Filed:
Feb. 28, 2013
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Claudia Ekstein, Ellwangen, DE;
Johannes Lippert, Buch am Wald, DE;
Holger Maltor, Aalen, DE;
Martin Weiser, Sinsheim, DE;
Heiko Siekmann, Aalen, DE;
Udo Dinger, Oberkochen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/00 (2006.01); G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0891 (2013.01);
Abstract
Substrates suitable for mirrors which are used at wavelengths in the EUV wavelength range have a main body () and a polishing layer (). The polishing layer () has a thickness of less than 10 μm and a root-mean-square roughness of less than 0.5 nm and the main body () is produced from an aluminum alloy. Moreover, a highly reflective layer () is provided on the polishing layer () of the substrate () of the EUV mirror ().