The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2015

Filed:

Mar. 17, 2009
Applicants:

Masanobu Miyao, Fukuoka, JP;

Hiroshi Nakashima, Fukuoka, JP;

Taizoh Sadoh, Fukuoka, JP;

Ichiro Mizushima, Yokohama, JP;

Masaki Yoshimaru, Hachioji, JP;

Inventors:

Masanobu Miyao, Fukuoka, JP;

Hiroshi Nakashima, Fukuoka, JP;

Taizoh Sadoh, Fukuoka, JP;

Ichiro Mizushima, Yokohama, JP;

Masaki Yoshimaru, Hachioji, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 31/00 (2006.01); H01L 27/06 (2006.01); H01L 21/02 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0617 (2013.01); H01L 21/02672 (2013.01); H01L 29/66984 (2013.01);
Abstract

At least first and second SiGe(0≦x≦1) layers are formed on an insulating film. At least first and second material layers are formed correspondingly to the at least first and second SiGe(0≦x≦1) layers. A lattice constant of the first SiGe(0≦x≦1) layer is matched with a lattice constant of the first material layer. A lattice constant of the second SiGe(0≦x≦1) layer is matched with a lattice constant of the second material layer.


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