The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2015
Filed:
Mar. 23, 2012
Takuma Shibahara, Tokyo, JP;
Michio Oikawa, Tokyo, JP;
Yutaka Hojo, Tokyo, JP;
Hitoshi Sugahara, Tokyo, JP;
Hiroyuki Shindo, Tokyo, JP;
Takuma Shibahara, Tokyo, JP;
Michio Oikawa, Tokyo, JP;
Yutaka Hojo, Tokyo, JP;
Hitoshi Sugahara, Tokyo, JP;
Hiroyuki Shindo, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A pattern measurement device includes: a storage section storing mask edge data of a circuit pattern and image data obtained by imaging the circuit pattern; an SEM contour extracting section receiving the image data, SEM contour of the circuit pattern, and cause an exposure simulator to generate estimated SEM contour data of an estimated SEM contour on the basis of the mask edge data and SEM contour data of the extracted SEM contour; a shape classifying section receiving the mask edge data, the SEM contour data, and the estimated contour data to classify the SEM contour data and the estimated SEM contour data into a one-dimensionally shaped contour and a two-dimensionally shaped contour; and an SEM contour sampling section receiving the SEM contour data and the estimated SEM contour data to sample the SEM contour data on the basis of types of the one-dimensionally and two-dimensionally shaped contours.