The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2015
Filed:
Jun. 21, 2012
Lin Wang, Iowa City, IA (US);
Pete Miller, Davenport, IA (US);
Jeff Underwood, Muscatine, IA (US);
Tonya Armstrong, Muscatine, IA (US);
Michael Kramer, Muscatine, IA (US);
Susan Freers, Muscatine, IA (US);
Roger Mcpherson, Muscatine, IA (US);
E. Daniel Hubbard, West Liberty, IA (US);
Terry Andren, Grover, MO (US);
Lin Wang, Iowa City, IA (US);
Pete Miller, Davenport, IA (US);
Jeff Underwood, Muscatine, IA (US);
Tonya Armstrong, Muscatine, IA (US);
Michael Kramer, Muscatine, IA (US);
Susan Freers, Muscatine, IA (US);
Roger McPherson, Muscatine, IA (US);
E. Daniel Hubbard, West Liberty, IA (US);
Terry Andren, Grover, MO (US);
Grain Processing Corporation, Muscatine, IA (US);
Abstract
Disclosed is a cold-water soluble starch and a process for preparing same. Generally, the process comprises providing a hydroxyalkyl starch and applying a shearing force to the starch in an extruder in the presence of moisture, the force and the moisture each being sufficient to gelatinize at least substantially all of the granules of the starch to thereby form a sheared starch. The starch is heated to its gelatinization temperature after the starch has passed partially through the barrel of the extruder, with the moisture being maintained at a level sufficiently high to allow gelatinization but sufficiency low to protect the starch from becoming too sticky to extrude. The extruded starch product thus formed may be used in connection with a number of film-forming, coating, and other applications.