The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Aug. 17, 2010
Applicant:
Einosuke Tsuda, Yamanashi, JP;
Inventor:
Einosuke Tsuda, Yamanashi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/409 (2013.01); C23C 16/45508 (2013.01); C23C 16/45531 (2013.01); C23C 16/45559 (2013.01); C23C 16/45563 (2013.01); C23C 16/45582 (2013.01);
Abstract
A gas supply device disposed opposite to a substrate mounted on a loading board in a processing container and supplying a process gas for processing the substrate comprises a top plate member having a recess formed to spread gradually toward the state in order to constitute a gas diffusion space at a position facing the substrate on the loading board, and a gas supply nozzle projecting into the recess from the top thereof and having a plurality of gas supply holes along the circumferential direction of the recess.
Published as:
WO2009104732A1; JP2009224775A; TW200952109A; CN101772833A; KR20100124198A; US2010310772A1; CN101772833B; KR101204614B1; JP5233734B2; US8945306B2; TWI498988B;