The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2015
Filed:
Mar. 28, 2011
Takuma Shibahara, Tokyo, JP;
Tsuyoshi Minakawa, Yokohama, JP;
Michio Oikawa, Machida, JP;
Yutaka Hojo, Hitachinaka, JP;
Hitoshi Sugahara, Hitachioota, JP;
Hiroyuki Shindo, Hitachinaka, JP;
Takuma Shibahara, Tokyo, JP;
Tsuyoshi Minakawa, Yokohama, JP;
Michio Oikawa, Machida, JP;
Yutaka Hojo, Hitachinaka, JP;
Hitoshi Sugahara, Hitachioota, JP;
Hiroyuki Shindo, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The present invention provides a pattern measuring apparatus () that: acquires the image contour of a circuit pattern formed by transferring design data; classifies the acquired image contour into shape structures; calculates normal vectors for each shape structure; maps the shape structures to the image contour; uses at least one normal direction for each shape structure to stabilize the normal directions to the image contour; and uses the normal vectors for each shape structure to determine the position of a SEM contour.