The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Dec. 21, 2011
Rick Endo, San Carlos, CA (US);
Kurt Weiner, San Jose, CA (US);
Indranil DE, Mountain View, CA (US);
James Tsung, Milpitas, CA (US);
Maosheng Zhao, San Jose, CA (US);
Jeremy Cheng, Sunnyvale, CA (US);
Rick Endo, San Carlos, CA (US);
Kurt Weiner, San Jose, CA (US);
Indranil De, Mountain View, CA (US);
James Tsung, Milpitas, CA (US);
Maosheng Zhao, San Jose, CA (US);
Jeremy Cheng, Sunnyvale, CA (US);
Intermolecular, Inc., San Jose, CA (US);
Abstract
A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.