The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2015

Filed:

Nov. 28, 2012
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Norbert Arnold, Hopewell Junction, NY (US);

Jin Liu, Chappaqua, NY (US);

Brian W. Messenger, Newburgh, NY (US);

Oliver D. Patterson, Poughkeepsie, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/58 (2006.01); G01R 31/26 (2014.01); H01L 21/20 (2006.01); H01L 21/66 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 22/14 (2013.01); H01L 28/40 (2013.01); H01L 22/32 (2013.01);
Abstract

A method including forming a first test structure and a second test structure in electrical contact with an inner buried plate and an outer buried plate, respectively, where the first and second test structures each comprise a deep trench filled with a conductive material, and measuring the voltage of the inner buried plate and the outer buried plate immediately after the formation of a deep trench isolation structure, where the inner buried plate and the outer buried plate are positioned on opposite sides of the deep trench isolation structure.


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