The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2014

Filed:

Apr. 24, 2012
Applicants:

Tim Baldauf, Dresden, DE;

Tom Herrmann, Dresden, DE;

Stefan Flachowsky, Dresden, DE;

Ralf Illgen, Dresden, DE;

Inventors:

Tim Baldauf, Dresden, DE;

Tom Herrmann, Dresden, DE;

Stefan Flachowsky, Dresden, DE;

Ralf Illgen, Dresden, DE;

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for forming integrated circuits and integrated circuits are disclosed. The integrated circuits comprise gate structures overlying and transverse to one or more fins that are delineated by trenches formed in a semiconductor substrate. Protruding portions are formed in the trenches in between the gate electrode structure on exposed sidewall surfaces of the one or more fins. The trenches are filled with an insulating material between the protruding portions and the gate structures.


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