The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Apr. 27, 2012
Shih-ming Chang, Zhubei, TW;
Ken-hsien Hsieh, Taipei, TW;
Tsong-hua Ou, Taipei, TW;
Ru-gun Liu, Zhubei, TW;
Fang-yu Fan, Hukou Township, Hsinchu County, TW;
Yuan-te Hou, Hsinchu, TW;
Shih-Ming Chang, Zhubei, TW;
Ken-Hsien Hsieh, Taipei, TW;
Tsong-Hua Ou, Taipei, TW;
Ru-Gun Liu, Zhubei, TW;
Fang-Yu Fan, Hukou Township, Hsinchu County, TW;
Yuan-Te Hou, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A device and method for fabricating a device is disclosed. An exemplary device includes a first conductive layer disposed over a substrate, the first conductive layer including a first plurality of conductive lines extending in a first direction. The device further includes a second conductive layer disposed over the first conductive layer, the second conductive layer including a second plurality of conductive lines extending in a second direction. The device further includes a self-aligned interconnect formed at an interface where a first conductive line of the first plurality of conductive lines is in electrical contact with a first conductive line of the second plurality of conductive lines. The device further includes a blocking portion interposed between a second conductive line of the first plurality of conductive lines and a second conductive line of the second plurality of conductive lines.