The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2014

Filed:

Jun. 22, 2011
Applicants:

Wim Deweerd, San Jose, CA (US);

Kim Van Berkel, Mountain View, CA (US);

Hiroyuki Ode, Hiroshima, JP;

Inventors:

Wim Deweerd, San Jose, CA (US);

Kim Van Berkel, Mountain View, CA (US);

Hiroyuki Ode, Hiroshima, JP;

Assignees:

Intermolecular, Inc., San Jose, CA (US);

Elpida Memory, Inc., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/306 (2006.01); H01L 49/02 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01L 28/60 (2013.01); H01L 21/02087 (2013.01); H01L 21/0209 (2013.01); H01L 21/32134 (2013.01);
Abstract

A method of removing non-noble metal oxides from material (e.g., semiconductor material) used to make a microelectronic device includes providing the material comprising traces of the conducting non-noble metal oxides; applying a chemical mixture (or chemical solution) to the material; removing the traces of the non-noble metal oxides from the material; and removing the chemical mixture from the material. The non-noble metal oxides comprise MoO, wherein x is a positive number between 0 and 3. The chemical solution comprises any one of HNO-based chemicals, HSO-based chemicals, HCl-based chemicals, or NHOH-based chemicals.


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