The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Aug. 31, 2010
Rajinder Dhindsa, San Jose, CA (US);
Michael C. Kellogg, Dublin, CA (US);
Babak Kadkhodayan, Fremont, CA (US);
Andrew D. Bailey, Iii, Pleasanton, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Michael C. Kellogg, Dublin, CA (US);
Babak Kadkhodayan, Fremont, CA (US);
Andrew D. Bailey, III, Pleasanton, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An arrangement for performing pressure control within a processing chamber substrate processing is provided. The arrangement includes a peripheral ring configured at least for surrounding a confined chamber volume that is configured for sustaining a plasma for etching the substrate during substrate processing. The peripheral ring includes a plurality of slots that is configured at least for exhausting processed byproduct gas from the confined chamber volume during substrate processing. The arrangement also includes a conductive control ring that is positioned next to the peripheral ring and is configured to include plurality of slots. The pressure control is achieved by moving the conductive control ring relative to the peripheral ring such that a first slot on the peripheral ring and a second slot on the conductive control ring are offset with respect to one another in a range of zero offset to full offset.