The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2014
Filed:
Mar. 07, 2012
Aiping Wu, Macungie, PA (US);
Yi-chia Lee, Dansheui Jen, TW;
Wen Dar Liu, Hsinchu Hsien, TW;
Machukar Bhaskara Rao, Fogelsville, PA (US);
Gautam Banerjee, Latham, NY (US);
Aiping Wu, Macungie, PA (US);
Yi-Chia Lee, Dansheui Jen, TW;
Wen Dar Liu, Hsinchu Hsien, TW;
Machukar Bhaskara Rao, Fogelsville, PA (US);
Gautam Banerjee, Latham, NY (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A water-rich hydroxylamine formulation for photoresist and post-etch/post-ash residue removal in applications wherein a semiconductor substrate comprises aluminum. The cleaning composition comprises from about 2 to about 15% by wt. of hydroxylamine; from about 50 to about 80% by wt. of water; from about 0.01 to about 5.0% by wt. of a corrosion inhibitor; from about 5 to about 45% by wt. of a component selected from the group consisting of: an alkanolamine having a pKa<9.0, a water-miscible solvent, and a mixture thereof. Employment of such composition exhibits efficient cleaning capability for Al substrates, minimal silicon etch while protecting aluminum for substrates comprising both materials.