The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Nov. 13, 2012
Applicant:

Intermolecular, Inc., San Jose, CA (US);

Inventors:

Nitin Kumar, Fremont, CA (US);

Tony P. Chiang, Campbell, CA (US);

Chi-I Lang, Cupertino, CA (US);

Prashant B. Phatak, San Jose, CA (US);

Jinhong Tong, Santa Clara, CA (US);

Assignee:

Intermolecular, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 45/00 (2006.01); G11C 13/00 (2006.01); H01L 27/24 (2006.01);
U.S. Cl.
CPC ...
G11C 13/0007 (2013.01); G11C 2213/52 (2013.01); H01L 45/1608 (2013.01); H01L 45/1253 (2013.01); H01L 45/04 (2013.01); H01L 45/1233 (2013.01); G11C 2213/73 (2013.01); H01L 45/146 (2013.01); G11C 2213/32 (2013.01); G11C 2213/72 (2013.01); H01L 27/2463 (2013.01);
Abstract

Nonvolatile memory elements are provided that have resistive switching metal oxides. The nonvolatile memory elements may be formed by depositing a metal-containing material on a silicon-containing material. The metal-containing material may be oxidized to form a resistive-switching metal oxide. The silicon in the silicon-containing material reacts with the metal in the metal-containing material when heat is applied. This forms a metal silicide lower electrode for the nonvolatile memory element. An upper electrode may be deposited on top of the metal oxide. Because the silicon in the silicon-containing layer reacts with some of the metal in the metal-containing layer, the resistive-switching metal oxide that is formed is metal deficient when compared to a stoichiometric metal oxide formed from the same metal.


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