The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Feb. 10, 2012
Chia-ming Ho, Hsinchu, TW;
Ke-ying Su, Taipei, TW;
Hsiao-shu Chao, Baoshan Township, TW;
Yi-kan Cheng, Taipei, TW;
Chia-Ming Ho, Hsinchu, TW;
Ke-Ying Su, Taipei, TW;
Hsiao-Shu Chao, Baoshan Township, TW;
Yi-Kan Cheng, Taipei, TW;
Abstract
A method of generating a bias-adjusted layout design of a conductive feature includes receiving a layout design of the conductive feature. If a geometry configuration of the layout design is within a first set of predetermined criteria, the bias-adjusted layout design of the conductive feature is generated according to a first layout bias rule. If the geometry configuration of the layout design is within a second set of predetermined criteria, the bias-adjusted layout design of the conductive feature is generated according to a second layout bias rule.