The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Mar. 24, 2011
Juergen Fischer, Heidenheim, DE;
Armin Schoeppach, Aalen, DE;
Matthias Orth, Neresheim-Elchingen, DE;
Norbert Muehlberger, Aalen-Ebnat, DE;
Thorsten Rassel, Huettlingen, DE;
Armin Werber, Gottenheim, DE;
Juergen Huber, Heidenheim, DE;
Juergen Fischer, Heidenheim, DE;
Armin Schoeppach, Aalen, DE;
Matthias Orth, Neresheim-Elchingen, DE;
Norbert Muehlberger, Aalen-Ebnat, DE;
Thorsten Rassel, Huettlingen, DE;
Armin Werber, Gottenheim, DE;
Juergen Huber, Heidenheim, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.