The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2014

Filed:

Feb. 07, 2014
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Chung Woh Lai, Singapore, SG;

Xiao Hu Liu, Briarcliff Manor, NY (US);

Anita Madan, Danbury, CT (US);

Klaus W. Schwarz, Somers, NY (US);

J. Campbell Scott, Los Gatos, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/322 (2006.01); A61N 5/00 (2006.01); G21G 5/00 (2006.01); H01L 29/10 (2006.01); H01L 29/78 (2006.01); H01L 21/268 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3221 (2013.01); H01L 21/3226 (2013.01); H01L 29/1054 (2013.01); H01L 29/7842 (2013.01); H01L 21/2686 (2013.01); H01L 21/268 (2013.01);
Abstract

A method for manipulating dislocations from a semiconductor device includes directing a light-emitting beam locally onto a surface portion of a semiconductor body that includes active regions of the semiconductor device and manipulating a plurality of dislocations located proximate to the surface portion of the semiconductor body utilizing the light-emitting beam. Manipulating the plurality of dislocations includes directly scanning the plurality of dislocations with the light-emitting beam to manipulate a location of each of the plurality of dislocations on the surface portion of the semiconductor body by adjusting a temperature of the surface portion of the semiconductor body corresponding to the plurality of dislocations and adjusting a scan speed of the a light-emitting beam.


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