The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
May. 24, 2011
Masato Horiguchi, Nirasaki, JP;
Hiroshi Tsujimoto, Nirasaki, JP;
Takashi Kitazawa, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
There is provided a plasma processing apparatus capable of easily exhausting a processing gas introduced in a space above a vertically movable upper electrode. The plasma processing apparatus includes a vertically movable upper electrodeinstalled at a ceiling wallof a processing chamberso as to face a lower electrodeand having a multiple number of discharge holesfor introducing the processing gas; a shield sidewallconfigured to surround the electrodes and a processing space between the electrodes; an inner gas exhaust pathformed at the inside of the shield sidewall and configured to exhaust the atmosphere in the processing space; and an outer gas exhaust pathinstalled at the outside of the shield sidewall and configured to exhaust the processing gas introduced into a space between the upper electrode and the ceiling wall.