The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2014

Filed:

Jan. 17, 2012
Applicants:

Richard C. Ujazdowski, Poway, CA (US);

Richard M. Ness, San Diego, CA (US);

J. Martin Algots, San Diego, CA (US);

Vladimir B. Fleurov, Escondido, CA (US);

Frederick A. Palenschat, San Diego, CA (US);

Walter D. Gillespie, Poway, CA (US);

Bryan G. Moosman, San Marcos, CA (US);

Thomas D. Steiger, San Diego, CA (US);

Brett D. Smith, Murrieta, CA (US);

Thomas E. Mckelvey, Ramona, CA (US);

Inventors:

Richard C. Ujazdowski, Poway, CA (US);

Richard M. Ness, San Diego, CA (US);

J. Martin Algots, San Diego, CA (US);

Vladimir B. Fleurov, Escondido, CA (US);

Frederick A. Palenschat, San Diego, CA (US);

Walter D. Gillespie, Poway, CA (US);

Bryan G. Moosman, San Marcos, CA (US);

Thomas D. Steiger, San Diego, CA (US);

Brett D. Smith, Murrieta, CA (US);

Thomas E. McKelvey, Ramona, CA (US);

Assignee:

Cymer, LLC, San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 3/08 (2006.01); H01S 3/036 (2006.01); H01F 38/10 (2006.01); H01F 3/10 (2006.01); H01F 27/22 (2006.01); H01S 3/041 (2006.01); H01S 3/225 (2006.01); H01S 3/097 (2006.01); H01F 27/26 (2006.01); H01S 3/04 (2006.01); H01S 3/23 (2006.01);
U.S. Cl.
CPC ...
H01S 3/036 (2013.01); H01S 3/225 (2013.01); H01S 3/097 (2013.01); H01F 38/10 (2013.01); H01F 3/10 (2013.01); H01F 27/266 (2013.01); H01F 27/22 (2013.01); H01S 3/0404 (2013.01); H01S 3/09702 (2013.01); H01S 3/2308 (2013.01); H01S 3/041 (2013.01);
Abstract

A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.


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