The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Nov. 01, 2011
Applicants:
Che-rong Laing, Hsinchu, TW;
Li-kong Turn, Taichung, TW;
Yung-yao Lee, Zhubei, TW;
Ping-hsi Yang, Hsinchu, TW;
Inventors:
Che-Rong Laing, Hsinchu, TW;
Li-Kong Turn, Taichung, TW;
Yung-Yao Lee, Zhubei, TW;
Ping-Hsi Yang, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); G03F 7/40 (2006.01); G03F 7/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/26 (2013.01); G03F 7/40 (2013.01);
Abstract
Methods for detecting and monitoring defects in a resist material are disclosed. In an example, a method includes forming a resist layer over a substrate; developing the resist layer; washing the developed resist layer with a thinner wash solution, wherein the washing reveals any negatively charged defects in the developed resist layer; and after the washing, inspecting for the negatively charged defects.