The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Aug. 01, 2012
Ru-gun Liu, Zhubei, TW;
Shuo-yen Chou, Ji-an Shiang, TW;
Hoi-tou NG, Hsinchu, TW;
Ken-hsien Hsieh, Taipei, TW;
Yi-yin Chen, Taipei, TW;
Ru-Gun Liu, Zhubei, TW;
Shuo-Yen Chou, Ji-an Shiang, TW;
Hoi-Tou Ng, Hsinchu, TW;
Ken-Hsien Hsieh, Taipei, TW;
Yi-Yin Chen, Taipei, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method for making a mask for an integrated circuit (IC) design includes receiving an IC design layout having a plurality IC features and performing a targeted-feature-surrounding (TFS) checking operation to identify a targeted-feature-surrounding-location (TFSL) in the IC design layout. The method also includes inserting a phase-bar (PB) to the TFSL, performing an optical proximity correction (OPC) to the IC design layout having the PB to form a modified IC design layout and providing the modified IC design layout for fabrication of the mask.