The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Sep. 14, 2012
Anthony DE LA Llera, Fremont, CA (US);
Michael C. Kellogg, Oakland, CA (US);
Alexei Marakhtanov, Albany, CA (US);
Rajinder Dhindsa, Pleasanton, CA (US);
Anthony de la Llera, Fremont, CA (US);
Michael C. Kellogg, Oakland, CA (US);
Alexei Marakhtanov, Albany, CA (US);
Rajinder Dhindsa, Pleasanton, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A plasma processing systems having at least one plasma processing chamber, comprising a movable grounding component, an RF contact component configured to receive RF energy from an RF source when the RF source provides the RF energy to the RF contact component, and a ground contact component coupled to ground. The plasma processing system further includes an actuator operatively coupled to the movable grounding component for disposing the movable grounding component in a first position and a second position. The first position represents a position whereby the movable grounding component is not in contact with at least one of the RF contact component and the ground contact component. The second position represents a position whereby the movable grounding component is in contact with both the RF contact component and the ground contact component.