The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2014

Filed:

Nov. 30, 2011
Applicants:

Peter Paul Steijaert, Eindhoven, NL;

Wilhelmus Josephus Box, Eskel, BE;

Emiel Jozef Eussen, Eindhoven, NL;

Erik Roelof Loopstra, Eindhoven, NL;

Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;

Ruud Antonius Catharina Maria Beerens, Roggel, NL;

Albertus Adrianus Smits, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03B 27/54 (2006.01); G03F 7/20 (2006.01); G03B 27/68 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70775 (2013.01);
Abstract

A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.


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