The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Nov. 25, 2009
Ying-chou Cheng, Zhubei, TW;
Ru-gun Liu, Hsinchu, TW;
Josh J. H. Feng, Lotung, TW;
Tsong-hua Ou, Taipei, TW;
Luke Lo, Pingjhen, TW;
Chih-ming Lai, Hsinchu, TW;
Wen-chun Huang, Tainan County, TW;
Ying-Chou Cheng, Zhubei, TW;
Ru-Gun Liu, Hsinchu, TW;
Josh J. H. Feng, Lotung, TW;
Tsong-Hua Ou, Taipei, TW;
Luke Lo, Pingjhen, TW;
Chih-Ming Lai, Hsinchu, TW;
Wen-Chun Huang, Tainan County, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure provides one embodiment of an integrated circuit (IC) design method. The method includes providing an IC design layout of a circuit; applying an electrical patterning (ePatterning) modification to the IC design layout according to an electrical parameter of the circuit and an optical parameter of IC design layout; and thereafter fabricating a mask according to the IC design layout.