The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
May. 20, 2011
Yuta Urano, Yokohama, JP;
Shigenobu Maruyama, Oiso, JP;
Toshiyuki Nakao, Yokohama, JP;
Toshifumi Honda, Yokohama, JP;
Yukihiro Shibata, Fujisawa, JP;
Yuta Urano, Yokohama, JP;
Shigenobu Maruyama, Oiso, JP;
Toshiyuki Nakao, Yokohama, JP;
Toshifumi Honda, Yokohama, JP;
Yukihiro Shibata, Fujisawa, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Proposed is a defect inspection method whereby: illuminating light having a substantially uniform illumination intensity distribution in one direction of a sample surface irradiated on the sample surface; multiple scattered light components, which are output in multiple independent directions, are detected among the scattered light from the sample surface and multiple corresponding scattered light detection signals are obtained; at least one of the multiple scattered light detection signals is processed and the presence of defects is determined; at least one of the multiple scattered light detection signals that correspond to each of the points determined by the processing as a defect is processed and the dimensions of the defect are determined; and the position and dimensions of the defect on the sample surface, at each of the points determined as a defect, are displayed.