The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Mar. 09, 2011
Florian Bach, Oberkochen, DE;
Daniel Benz, Winnenden, DE;
Severin Waldis, Aalen, DE;
Armin Werber, Gottenheim, DE;
Berndt Warm, Schwaig, DE;
Florian Bach, Oberkochen, DE;
Daniel Benz, Winnenden, DE;
Severin Waldis, Aalen, DE;
Armin Werber, Gottenheim, DE;
Berndt Warm, Schwaig, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.